The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2006

Filed:

Jun. 29, 2001
Applicants:

Osamu Toyama, Kakogawa, JP;

Eiro Fujii, Takatsuki, JP;

Tomasz Kowalczyk, Providence, RI (US);

Shinichi Horita, Osaka, JP;

Inventors:

Osamu Toyama, Kakogawa, JP;

Eiro Fujii, Takatsuki, JP;

Tomasz Kowalczyk, Providence, RI (US);

Shinichi Horita, Osaka, JP;

Assignee:

Minolta Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a method for generating a three-dimensional model by modifying a standard model based on measured data without causing a topical improper modification. In the method, it is decided whether to further modify the standard model or to finish the modification of the standard model based on integrated evaluation of two or more functions selected from a first function relating to a distance between the standard model and the measured data, a second function relating to a distance between a characteristic point defined on the standard model and a characteristic point specified on the measured data and corresponding to the characteristic point defined on the standard model and a third function relating to a distance between an outline defined on the standard model and an outline specified on the measured data and corresponding to the outline on the standard model.


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