The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2006
Filed:
Oct. 27, 2003
Frank Y. Xu, Austin, TX (US);
Nicholas E. Stacey, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Ecron D. Thompson, Austin, TX (US);
Frank Y. Xu, Austin, TX (US);
Nicholas E. Stacey, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Ecron D. Thompson, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
University of Texas System, Austin, TX (US);
Abstract
One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.