The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2006
Filed:
Mar. 20, 2003
Yoshikazu Sato, Tokyo, JP;
Akifumi Kamijima, Tokyo, JP;
Yoshikazu Sato, Tokyo, JP;
Akifumi Kamijima, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A method of forming a mask pattern includes a step of laminating a first resist layer on a base layer, a step of exposing the first resist layer using a first pattern with a pattern of at least one via hole, a step of developing the first resist layer exposed to remove a part of the first resist layer, the part corresponding to an area of the at least one via hole, a step of laminating a second resist layer on the first resist layer and on the base layer in the area of the at least one via hole, a step of exposing the second resist layer using a second pattern, and a step of developing the second resist layer exposed and the first resist layer to remove a part of the second resist layer and all of the first resist layer so as to form the mask pattern made of the second resist layer.