The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2006
Filed:
Apr. 01, 2003
Applicant:
Tatsutoshi Suzuki, Yokkaichi, JP;
Inventor:
Tatsutoshi Suzuki, Yokkaichi, JP;
Assignee:
Toho Engineering Kabushiki Kaisha, Mie, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
It is provided a polishing pad of novel construction capable of controlling actively and efficiently a slurry flow during polishing a surface of a semiconductor substrate, such as a wafer, thus making it possible to precisely and stably performing a desired polishing process. Onto a surface of a pad substrateof synthetic resin material, formed is a grooveextending approximately circumferentially. An inner circumferential wall surfaceand an outer circumferential wall surfaceare made parallel to each other and slant with respect to a center axisof the pad substrate