The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
May. 18, 2004
Canyun Wang, Norwalk, CT (US);
Canyun Wang, Norwalk, CT (US);
Schlumberger Technology Corporation, Ridgefield, CT (US);
Abstract
Methods and related apparatus for generating dispersion curves and conducting shear slowness logging are set forth. The methods include backpropagating detected dispersive waveforms in the Fourier domain while accounting for dispersion in an anisotropic and inhomogeneous formation, and stacking the processed waveforms. The stacking may occur in the frequency or time domains. The semblance of the stacked and windowed waveforms is compared against the detected waveforms. In accounting for dispersion during backpropagation, a plurality of parameters which describe dispersion curves are varied over ranges in order to optimize semblance. At each depth of interest, it is then possible to obtain a dispersion curve of greatest semblance. Where both an x-dipole and y-dipole are used to generate the waves, a dispersion curve of greatest semblance for each may be generated. In addition, from the dispersion curves, formation shear slowness(es) may be plotted as a function of formation depth and orientation.