The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Dec. 28, 2001
Applicant:
Nehal Dantwala, Peekskill, NY (US);
Inventor:
Nehal Dantwala, Peekskill, NY (US);
Assignee:
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/21 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is provided for deriving an objective sharpness metric for objectively determining the level of image sharpness of many and unspecific images having different degrees of sharpness. The method for deriving the objective sharpness metric utilizes sub-band frequency information and false edge information for both an original video sequence and a sharpened sequence to be scored.
Dantwala, Nehal. (2006). Method for deriving an objective sharpness metric (U.S. Patent No. 7119854). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7119854
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile