The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Apr. 05, 2004
Applicants:
Robert W. Callahan, Nanuet, NY (US);
Mark G. Stevens, Metuchen, NJ (US);
Muguo Chen, Bedford Hills, NY (US);
Inventors:
Robert W. Callahan, Nanuet, NY (US);
Mark G. Stevens, Metuchen, NJ (US);
Muguo Chen, Bedford Hills, NY (US);
Assignee:
eVionyx, Inc., Hawthorne, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
The polymer matrix material includes a polymerization product of one or more monomers selected from the group of water-soluble, ethylenically-unsaturated acids and acid derivatives, and a crosslinking agent. A quantity of water is used for polymerization, such that the polymer material is swelled to a defined volume upon curing. Optionally, a water-soluble or water-swellable polymer and/or a chemical polymerization initiator.