The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Mar. 07, 2002
H. Sam Bergh, San Francisco, CA (US);
Shenheng Guan, Palo Alto, CA (US);
James R. Engstrom, Ithaca, NY (US);
Steffen Hardt, Mainz, DE;
Astrid Lohf, Karlsruhe, DE;
Frank Michel, Bad Mergenthaim, DE;
H. Sam Bergh, San Francisco, CA (US);
Shenheng Guan, Palo Alto, CA (US);
James R. Engstrom, Ithaca, NY (US);
Steffen Hardt, Mainz, DE;
Astrid Lohf, Karlsruhe, DE;
Frank Michel, Bad Mergenthaim, DE;
Symyx Technologies, Inc., Santa Clara, CA (US);
Abstract
Parallel flow chemical processing systems, such as parallel flow chemical reaction systems are disclosed. These systems are adapted to simultaneously and independently vary temperature between separate flow channels, preferably by employing separate, individual heating elements in thermal communication with each of four or more parallel flow reactors. The flow reactors are preferably isolated from each other using a thermal isolation system comprising fluid-based heat exchange. In preferred embodiments, the axial heat flux can be fixedly or controllably varied.