The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Feb. 05, 2004
Xiongwei Ji, Singapore, SG;
Jianzhong Shi, Singapore, SG;
Darren Soonkeong NG, Singapore, SG;
Kakeng Ling, Bukit Batok, SG;
Huitong NG, Singapore, SG;
Chinsoon Koh, Singapore, SG;
Yuanda Randy Cheng, Phoenix, AZ (US);
Steven Hiyoshi Sawaski, Scotts Valley, CA (US);
Xiongwei Ji, Singapore, SG;
Jianzhong Shi, Singapore, SG;
Darren Soonkeong Ng, Singapore, SG;
Kakeng Ling, Bukit Batok, SG;
Huitong Ng, Singapore, SG;
Chinsoon Koh, Singapore, SG;
Yuanda Randy Cheng, Phoenix, AZ (US);
Steven Hiyoshi Sawaski, Scotts Valley, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A novel method of manufacturing a novel recording media is disclosed. The manufacturing method includes obtaining a substrate having an inside diameter and an outside diameter and creating a radial profile of an intensive property, such as Hc, of a multilayer magnetic layer containing at least a first magnetic layer and a second magnetic layer deposited on the substrate, from the inside diameter to the outside diameter by forming a radial profile of an extensive property, such as MrT or T, of either the first magnetic layer or the second magnetic layer from the inside diameter to the outside diameter.