The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2006

Filed:

Apr. 16, 2003
Applicants:

Joseph John Sumakeris, Apex, NC (US);

Michael James Paisley, Garner, NC (US);

Michael John O'loughlin, Chapel Hill, NC (US);

Inventors:

Joseph John Sumakeris, Apex, NC (US);

Michael James Paisley, Garner, NC (US);

Michael John O'Loughlin, Chapel Hill, NC (US);

Assignee:

Cree, Inc., Durham, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for controlling parasitic deposits in a deposition system for depositing a film on a substrate, the deposition system defining a reaction chamber for receiving the substrate and including a process gas in the reaction chamber and an interior surface contiguous with the reaction chamber, includes flowing a buffer gas between the interior surface and at least a portion of the process gas to form a gas barrier layer such that the gas barrier layer inhibits contact between the interior surface and components of the process gas.


Find Patent Forward Citations

Sumakeris, Joseph. (2006). Methods for controlling formation of deposits in a deposition system and deposition methods including the same (U.S. Patent No. 7118781). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7118781

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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