The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2006

Filed:

Oct. 01, 2001
Applicant:

Michael L. Van DE Vanter, Mountain View, CA (US);

Inventor:

Michael L. Van De Vanter, Mountain View, CA (US);

Assignee:

Sun Microsystems, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

An editor or software engineering tool may be configured to render whitespace between adjacent tokens, wherein the amount of whitespace between any two adjacent tokens is determined according to language-specific style rules and scaled in accordance with display considerations. In some realizations, the operative scaling is selected or defined by a user according to the user's visual preferences. In some realizations, the operative scaling relates to requirements or constraints of an automated layout mechanism. For example, a particular scaling may be calculated to adjust line length in conformance with a desired margin alignment or to optimize layout when long lines are automatically wrapped (or folded) in some automatic way.


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