The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2006

Filed:

May. 04, 2005
Applicants:

Scott W. Corzine, Sunnyvale, CA (US);

Michael Renne Ty Tan, Menlo Park, CA (US);

Chao Kun Lin, Fremont, CA (US);

Jintian Zhu, Palo Alto, CA (US);

Michael H. Leary, Fremont, CA (US);

Inventors:

Scott W. Corzine, Sunnyvale, CA (US);

Michael Renne Ty Tan, Menlo Park, CA (US);

Chao Kun Lin, Fremont, CA (US);

Jintian Zhu, Palo Alto, CA (US);

Michael H. Leary, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A distributed Bragg reflector and a method of fabricating the same incorporates a support for supporting the gaps against collapse. The method includes forming a plurality of alternating structure and sacrificial layers on a substrate. The structure and sacrificial layers are etched into at least one mesa protruding from the substrate. A support layer is formed on the at least one mesa leaving a portion of the structure and sacrificial layers exposed. At least a portion of at least one of the exposed sacrificial layers are etched from between the structure layers to form gaps between the structure layers.


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