The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
Jul. 15, 2004
Applicants:
Xingtao Wu, Woburn, MA (US);
Cardinal Warde, Hopkinton, MA (US);
Inventors:
Xingtao Wu, Woburn, MA (US);
Cardinal Warde, Hopkinton, MA (US);
Assignee:
Optron Systems, Inc., Bedford, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A high angular deflection micro-mirror system including a substrate, a spacer structure extending from the substrate, a deformable membrane supported by the spacer structure, one or more supports located off center on the deformable membrane, and one or more mirrors on the support cantilevered therefrom to achieve a high angular deflection of the mirrors as the deformable membranes deform.