The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
May. 29, 2002
Applicants:
Hideya Kumomi, Kanagawa, JP;
Hidemasa Mizutani, Kanagawa, JP;
Shigeki Kondo, Kanagawa, JP;
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/205 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for producing a crystalline thin film is provided which comprises melting and resolidifying a starting thin film having regions different in the state coexisting continuously. A small region of the starting thin film has a size distribution of number concentration of crystal grains or crystalline clusters different from that of the surrounding region. In the process of melting and resolidification, the crystal grain grows preferentially in the one region to control the location of the crystal grain in the crystalline thin film.