The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2006

Filed:

Oct. 17, 2000
Applicants:

Xiao Ping Zhou, Lompoc, CA (US);

Sam Bergh, San Francisco, CA (US);

Christopher E. Dube, Lexington, MA (US);

Lynn Van Erden, Livermore, CA (US);

Inventors:

Xiao Ping Zhou, Lompoc, CA (US);

Sam Bergh, San Francisco, CA (US);

Christopher E. Dube, Lexington, MA (US);

Lynn Van Erden, Livermore, CA (US);

Assignee:

Symyx Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for use in parallel reaction of materials. The apparatus includes a base having a plurality of reaction wells formed therein and a sealing device positioned over the reaction wells for individually sealing each of the reaction wells. One of the sealing device and the base having chamfered ridges extending generally around a periphery of each of said plurality of reaction wells. The other of the sealing device and the base having a contact surface formed of a material softer than the material of the chamfered ridges to create a knife-edge seal between the sealing device and the base when the sealing device and the base are forced into contact with one another.


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