The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2006

Filed:

Feb. 26, 2004
Applicant:

Takayuki Iseki, Yokohama, JP;

Inventor:

Takayuki Iseki, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract

A magnetron sputtering apparatusis composed of a vacuum chambera targeta cathodethat holds the targetin the vacuum chambera substratean anodethat holds the substrateand is allocated above the cathodeso as to face the substratetoward the targeton the cathodea permanent magnetthat generates magnetic fieldand is allocated under the cathodeand a rotation controllerfor rotating the permanent magnetso as to pivot on a center axis of the targetThe permanent magnetis further composed of a basea first permanent magnetthat is fixed on the basein the middle and a second permanent magnetin a ring shape that is fixed in an external circumferential area of the baseso as to surround the first permanent magnetwherein a magnetic polarity of the second permanent magnetis inverse with respect to that of the first permanent magnetand magnetic field strength of the second permanent magnetis weaker than that of the first permanent magnetand further an upper portion of the permanent magnetis in a cylindrical shape of which top portion is cut diagonally.


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