The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
Feb. 28, 2005
Hiroshi Kiguchi, Suwa, JP;
Hitoshi Fukushima, Suwa, JP;
Satoshi Nebashi, Suwa, JP;
Tatsuya Shimoda, Suwa, JP;
Hiroshi Kiguchi, Suwa, JP;
Hitoshi Fukushima, Suwa, JP;
Satoshi Nebashi, Suwa, JP;
Tatsuya Shimoda, Suwa, JP;
Seiko Epson Corporation, , JP;
Abstract
A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.