The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2006

Filed:

Aug. 30, 2002
Applicants:

David L. Ii, Owego, NY (US);

Elliott D. Reitz, Ii, Bradenton, FL (US);

Dennis A. Tillotson, Glen Aubrey, NY (US);

Inventors:

David L. Ii, Owego, NY (US);

Elliott D. Reitz, II, Bradenton, FL (US);

Dennis A. Tillotson, Glen Aubrey, NY (US);

Assignee:

Lockheed Martin Corporation, Bethesda, MD (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and computer program product are disclosed for generating training data over a plurality of feature variables for a new output class in a pattern recognition classifier representing a plurality of existing classes with previously calculated statistical parameters. Deviation measures are generated for each feature variable for each of the plurality of existing classes from the calculated statistical parameters. The deviation measures for each feature variable are averaged across the plurality of existing classes. Feature data is extracted from an ideal pattern, representing the new class, for each of the feature variables. Statistical parameters are approximated for each feature variable for the new class from the extracted feature data and the averaged deviation measures.


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