The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Jun. 09, 2003
Hiromi Ishikawa, Kanagawa, JP;
Akinori Harada, Kanagawa, JP;
Kazuhiko Nagano, Kanagawa, JP;
Yoji Okazaki, Kanagawa, JP;
Takeshi Fujii, Kanagawa, JP;
Hideo Yamanaka, Kanagawa, JP;
Hiromitsu Yamakawa, Saitama-ken, JP;
Hiromi Ishikawa, Kanagawa, JP;
Akinori Harada, Kanagawa, JP;
Kazuhiko Nagano, Kanagawa, JP;
Yoji Okazaki, Kanagawa, JP;
Takeshi Fujii, Kanagawa, JP;
Hideo Yamanaka, Kanagawa, JP;
Hiromitsu Yamakawa, Saitama-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Fujinon Corporation, Saitama, JP;
Abstract
A laser annealer has a laser light source with at least one GaN-type semiconductor laser and is configured so as to form emission points that emit laser beams having a wavelength of 350 to 450 nm, and a scanning device for scanning an annealing surface with the laser beams. The laser annealer may have a spatial light modulator for modulating the laser beams, and in which pixel portions whose light modulating states change in accordance with control signals are arranged on a substrate. The invention is applied to a laser thin-film forming apparatus. The apparatus has a laser source that has at least one semiconductor laser and is configured so as to form emission points, and an optical system for focusing laser beams into a single beam in the width direction of a substrate.