The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2006

Filed:

Jan. 21, 2004
Applicants:

Hiroshi Suzuki, Tokyo, JP;

Takeshi Kanetaka, Tokyo, JP;

Miki Oohashi, Tokyo, JP;

Noboru Sasaki, Tokyo, JP;

Takayuki Nakajima, Tokyo, JP;

Ryoji Ishii, Tokyo, JP;

Inventors:

Hiroshi Suzuki, Tokyo, JP;

Takeshi Kanetaka, Tokyo, JP;

Miki Oohashi, Tokyo, JP;

Noboru Sasaki, Tokyo, JP;

Takayuki Nakajima, Tokyo, JP;

Ryoji Ishii, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 18/00 (2006.01); B32B 27/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vapor-deposited film having a substrate consisting essentially of a polymer material and a vapor-deposited layer consisting essentially of a ceramic, the substrate being subjected to plasma pre-treatment using a hollow anode plasma treatment device, prior to vapor deposition of the vapor-deposited layer.


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