The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Apr. 14, 2003
Applicants:
Hideaki Hirabayashi, Yokohama, JP;
Akiko Saito, Yokohama, JP;
Naoaki Sakurai, Yokohama, JP;
Yoshihiro Oshibe, Chita-gun, JP;
Masahiro Ishidoya, Chigasaki, JP;
Inventors:
Hideaki Hirabayashi, Yokohama, JP;
Akiko Saito, Yokohama, JP;
Naoaki Sakurai, Yokohama, JP;
Yoshihiro Oshibe, Chita-gun, JP;
Masahiro Ishidoya, Chigasaki, JP;
Assignees:
Kabushiki Kaisha Toshiba, Tokyo, JP;
NOF Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
There is disclosed a polishing cloth having an abrasive layer containing a polymer material which is a hydrolyzable with an aqueous medium and being capable of exhibiting a stable polishing performance for a relatively long period of time without necessitating a dressing treatment.