The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2006

Filed:

Jun. 28, 2004
Applicants:

Ikuo Mizobata, Kamikyo-Ku, JP;

Yusuke Muraoka, Kamikyo-Ku, JP;

Kimitsugu Saito, Kamikyo-Ku, JP;

Ryuji Kitakado, Kamikyo-Ku, JP;

Yoichi Inoue, Takasago, JP;

Yoshihiko Sakashita, Takasago, JP;

Katsumi Watanabe, Takasago, JP;

Masahiro Yamagata, Takasago, JP;

Hisanori Oshiba, Takasago, JP;

Inventors:

Ikuo Mizobata, Kamikyo-Ku, JP;

Yusuke Muraoka, Kamikyo-Ku, JP;

Kimitsugu Saito, Kamikyo-Ku, JP;

Ryuji Kitakado, Kamikyo-Ku, JP;

Yoichi Inoue, Takasago, JP;

Yoshihiko Sakashita, Takasago, JP;

Katsumi Watanabe, Takasago, JP;

Masahiro Yamagata, Takasago, JP;

Hisanori Oshiba, Takasago, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

When the hatch of a substrate washing chamberis opened to receive a substrate, certain valves are closed, and a valve is opened, supply COto purge the substrate washing chamberto and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamberso that the COexpels any gas and unwanted air from the substrate washing chamberand the conduits. Thereafter, super critical COis used to wash the substrate and clean the circulation line. The flow of supercritical COis sent to the substrate washing chamber. After flowing through the circulation line, including a circulation channel, it passes through a bypass channelto a decompressor. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bathtogether with the flow.


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