The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Sep. 12, 2003
Applicants:
Norman W. Robson, Hopewell Junction, NY (US);
Teresa J. Wu, Pleasant Valley, NY (US);
Inventors:
Norman W. Robson, Hopewell Junction, NY (US);
Teresa J. Wu, Pleasant Valley, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of using special designed wiring level mask(s) to determine product transistor and circuit performance in a chip during the early portion of the product evaluation cycle saves weeks of time that would have been taken by the passage of the wafer through the fab. The method also saves cost during production by identifying wafers for rework at an early stage.
Robson, Norman. (2006). Using a partial metal level mask for early test results (U.S. Patent No. 7111257). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7111257
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile