The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Dec. 20, 2001
Khanh Phi Van Doan, Ryde, AU;
Khanh Phi Van Doan, Ryde, AU;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The methodrenders a self-overlapping polygon, wherein the polygon is a set of one or more closed curves each comprising line segments. The method performs, for a currently scanned pixel that overlaps both sides of a line segment of the self-overlapping polygon within a currently scanned scanline, the following steps. The methoddecomposesthat portion of the polygon that lies within the currently scanned pixel into a number of closed loops comprising at least those portions of those line segments that lie within the currently scanned pixel, the closed loops are such that when they are combined the combination is substantially equivalent to that portion of the polygon that lies within the currently scanned pixel. The methodcombinesincrementally the closed loops and determines one or more winding count values representative of respective weighted averages of winding counts of the combined closed loops. The methodthen determinesa real opacity of the currently scanned pixel according to a predetermined fill rule utilizing an intrinsic opacity of said polygon and the one or more winding count values. The methodfinally rendersthe currently scanned pixel with the determined real opacity.