The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Mar. 28, 2003
Applicant:
Naomasa Shiraishi, Urawa, JP;
Inventor:
Naomasa Shiraishi, Urawa, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/86 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure apparatus and method in which a mark on an object is illuminated, and plural pairs of two diffractive beams of same order are generated and directed to different reference gratings to detect positional information of the mark. Beams received from the different reference gratings have different order.
Quick Actions:
Shiraishi, Naomasa. (2006). Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus (U.S. Patent No. 7109508). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7109508
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