The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2006

Filed:

Feb. 02, 2004
Applicants:

Yi Yeol Lyu, Daejeon-Si, KR;

Jin Heong Yim, Daejeon-Si, KR;

Ki Yong Song, Seoul, KR;

Hyun Dam Jeong, Gyeonggi-Do, KR;

Joon Sung Ryu, Incheon-Si, KR;

Inventors:

Yi Yeol Lyu, Daejeon-Si, KR;

Jin Heong Yim, Daejeon-Si, KR;

Ki Yong Song, Seoul, KR;

Hyun Dam Jeong, Gyeonggi-Do, KR;

Joon Sung Ryu, Incheon-Si, KR;

Assignee:

Samsung Electronic Co., Ltd., Gyeonngi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnecting layers of a semiconductor device.


Find Patent Forward Citations

Lyu, Yi. (2006). Siloxane-based resin and interlayer insulating film formed using the same (U.S. Patent No. 7108922). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7108922

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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