The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Dec. 04, 2002
Markus Brummayer, Aschach/Donau, AT;
Gerald Eckerstorfer, Linz, AT;
Gerald Hohenbichler, Kronstorf, AT;
Karl Moerwald, St. Florian, AT;
Markus Brummayer, Aschach/Donau, AT;
Gerald Eckerstorfer, Linz, AT;
Gerald Hohenbichler, Kronstorf, AT;
Karl Moerwald, St. Florian, AT;
Abstract
To achieve the highest possible separation rate for foreign particles in a tundish combined, at the same time, with a minimized level of inclusions, the refractory-lined interior space of the tundish, as a function of an operating bath level (h), satisfies the condition that a dimensionless ratio (κ) of the refractory-lined surface area (A) to the filling volume (V) which is delimited by this refractory-lined surface area and the bath-level-dependent exposed surface area (A) and results from the relationship be between 3.83 and 4.39.