The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2006

Filed:

Jun. 29, 2004
Applicants:

Dehua Yang, Savage, MN (US);

Thomas J. Wyrobek, Edina, MN (US);

Inventors:

Dehua Yang, Savage, MN (US);

Thomas J. Wyrobek, Edina, MN (US);

Assignee:

Hysitron, Incorporated, Minneapolis, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B43L 13/00 (2006.01); G01B 5/20 (2006.01); G01B 5/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming a topographical image of the heterogeneous variations in a surface of a material has a first machining step and a second scanning step. The preferred machining step uses a preselected scribing tool to scribe a plurality of adjacent grooves in a selected material surface at a preselected constant force. This machining step produces a machined surface whose local elevations relative to a datum plane are dependent on the local hardness or wear resistance of the surface. Then the scanning step shifts the scribing tool across the surface in contact with the surface, and measures the elevation of the tool at a plurality of selected surface coordinates. The measured elevations allow formation of a topological map depicting sub-micron structural features of the surface.


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