The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Apr. 02, 2004
Takashi Nishi, Tsukuba-shi, Ibaraki, JP;
Takashi Nishi, Tsukuba-shi, Ibaraki, JP;
Other;
Abstract
A photosensitive material is coated on an insulating material () stacked on a substrate () (FIG.A), and exposed and developed using a mask having a light-shielding film capable of controlling a light transmittance from 100% to 0% annularly and continuously to form a spiral photosensitive material (FIG.B). After conducting treatment at a high temperature, the insulating material under the photosensitive material is spirally formed by etching (FIG.C). A metal () is stacked on the substrate (FIG.D), and a photosensitive material is coated (FIG.E). The photosensitive material is exposed and developed using a mask having an annular light-shielding film with a light transmittance of 0% to leave the photosensitive material covering only the metal on the base of the spiral structure (FIG.F). After treatment at a high temperature is conducted and the metal exposed is etched (FIG.G), the photosensitive material is removed (FIG.H).