The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7106994 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 12, 2006

Filed:

Oct. 29, 2002
Applicant:

Wan-ha Kim, Gyeonggi-do, KR;

Inventor:

Wan-ha Kim, Gyeonggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G 15/10 (2006.01); G03G 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of preventing a flow pattern in a wet-type color image forming apparatus and a system adopting the same includes a material layer directly contacting a developing roller of a developing unit of a photosensitive body of the image forming apparatus and having a thickness of 7–15 μm. A size of an essential composition used for representing corresponding one of colors in high-concentration ink is 0.7–1.5 μm. A hold up volume is not formed between the developing roller and the photosensitive body during a developing process, and a flow pattern such as a stripe, is not formed in a final image, and even though the flow pattern is formed in the final image, the flow pattern can be minimized.


Find Patent Forward Citations

Kim, Wan-ha. (2006). Method of preventing flow pattern in wet-type color image forming apparatus and system adopting the same (U.S. Patent No. 7106994). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7106994

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