The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Apr. 10, 2003
Lijie Guan, Milpitas, CA (US);
Hung Liang HU, Los Altos Hills, CA (US);
Yaw Shing Tang, Saratoga, CA (US);
Kochan Ju, Monte Sereno, CA (US);
Lijie Guan, Milpitas, CA (US);
Hung Liang Hu, Los Altos Hills, CA (US);
Yaw Shing Tang, Saratoga, CA (US);
Kochan Ju, Monte Sereno, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
Conventional perpendicular writers that utilize an extended return pole are subject to large undershoot fields. This problem has been reduced by replacing the prior art extended return pole by one whose magnetic potential has been increased relative to both the main and return poles. In a first embodiment, a second non-magnetic gap is inserted between the extended return pole and the return pole. In a second embodiment, the extended return pole is made very thin, thereby increasing its reluctance, while a third embodiment combines both reluctance-increasing features in a single design.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile