The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Nov. 13, 2001
Takeshi Mitsuishi, Tokyo, JP;
Hitoshi Kamura, Tokyo, JP;
Kenichi Shinde, Tokyo, JP;
Hiroki Takei, Tokyo, JP;
Akinori Kobayashi, Tokyo, JP;
Yukihiro Takahashi, Tokyo, JP;
Yuko Watanabe, Tokyo, JP;
Takeshi Mitsuishi, Tokyo, JP;
Hitoshi Kamura, Tokyo, JP;
Kenichi Shinde, Tokyo, JP;
Hiroki Takei, Tokyo, JP;
Akinori Kobayashi, Tokyo, JP;
Yukihiro Takahashi, Tokyo, JP;
Yuko Watanabe, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.