The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Dec. 30, 2002
Thomas J. Meyer, Dallas, TX (US);
Brett A. Mangrum, Dallas, TX (US);
Mark F. Reed, Richardson, TX (US);
James D. Huffman, Plano, TX (US);
Michael A. Mignardi, Richardson, TX (US);
Wei-yan Shih, Plano, TX (US);
Thomas J. Meyer, Dallas, TX (US);
Brett A. Mangrum, Dallas, TX (US);
Mark F. Reed, Richardson, TX (US);
James D. Huffman, Plano, TX (US);
Michael A. Mignardi, Richardson, TX (US);
Wei-Yan Shih, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A system and method of providing a micromirror pixelthat is highly resistant to bright failure states. The micromirroruses an asymmetric yoketo ensure the mirror is only attracted to the address electrode in one rotation direction. The landing mechanism on the other side of the torsion binge axis also is altered to allow the pixel to over rotate in the 'off' direction. The over rotation ensures that light reflected by the mirror when in the off direction will miss the projection lens pupil, allowing the corresponding pixel to remain dark in both an operational and failed state.