The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Mar. 28, 2003
Sang-ho Jeon, Seongnam, KR;
Do-hun Pyun, Suwon, KR;
Sang-Ho Jeon, Seongnam, KR;
Do-Hun Pyun, Suwon, KR;
Samsung SDI Co., Ltd., Suwon-si, KR;
Abstract
A shadow mask for a cathode ray tube includes an aperture area having a plurality of apertures passing electron beams, a non-aperture area extending a predetermined distance from a circumference of the aperture area and a skirt extending a predetermined distance from an outside circumference of the non-aperture area and bent at a predetermined angle to the non-aperture area, wherein the aperture area has predetermined curvature radii, and wherein if a curvature radius in a horizontal direction of the aperture area is R, and a curvature radius in a vertical direction is R, the following condition is satisfied,0.6<<0.8.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile