The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2006

Filed:

Jul. 26, 2004
Applicants:

Tomoya Sawaki, Hiratsuka, JP;

Hiroyuki Kenmochi, Hiratsuka, JP;

Yoji Hori, Hiratsuka, JP;

Inventors:

Tomoya Sawaki, Hiratsuka, JP;

Hiroyuki Kenmochi, Hiratsuka, JP;

Yoji Hori, Hiratsuka, JP;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 313/00 (2006.01); C07D 493/08 (2006.01); C07D 307/77 (2006.01); C07C 69/74 (2006.01);
U.S. Cl.
CPC ...
Abstract

An object of the present invention is to provide a novel monomer compound having a lactone structure which gives polymers having more excellent feature as resist material, etc. The present invention relates to a compound represented by the following formula [1]: wherein Rand Rare an alkyl group; Rand Rare each independently hydrogen atom or an alkyl group; Ris hydrogen atom, acryloyl group or methacryloyl group; and X is a methylene group which may have an alkyl group or an ethylene group which may have an alkyl group. The present invention provides a compound having a lactone structure which gives a polymer having more excellent feature particularly as a resist material and also provides a hydroxy lactone being useful as a material, etc. therefor.


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