The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Feb. 06, 2004
Marcus Weck, Atlanta, GA (US);
Amy Meyers, Atlanta, GA (US);
Marcus Weck, Atlanta, GA (US);
Amy Meyers, Atlanta, GA (US);
Georgia Tech Research Corporation, Atlanta, GA (US);
Abstract
This invention relates to the synthesis of Mq-containing monomeric compounds, comprising a polymerizable moiety, an Mq-moiety, and an optional chemical spacer therebetween, wherein q, in each instance, comprises an 8-hydroxyquinoline residue, M is a metal such as Mg, Zn, Al, Ga, or In, and n is 2 or 3 as the valence of the metal requires. For example, the polymerization of Znq- or Alq-containing monomers, in the presence or absence of a co-monomer, provided a Znq- or Alq-containing polymer, which retained the optical properties of Znqor Alqin solution, respectively. The Mq-containing polymers may be used in, among other things, the fabrication of light-emitting diodes (LEDs).