The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Mar. 03, 2003
Norikazu Nishiyama, Toyonaka, JP;
Yoshiaki Oku, Kyoto, JP;
Shunsuke Tanaka, Toyonaka, JP;
Korekazu Ueyama, Takarazuka, JP;
Norikazu Nishiyama, Toyonaka, JP;
Yoshiaki Oku, Kyoto, JP;
Shunsuke Tanaka, Toyonaka, JP;
Korekazu Ueyama, Takarazuka, JP;
Rohm Co., Ltd., Kyoto, JP;
Abstract
It is an object to provide, with a high productivity, a dielectric thin film having a high degree of pore and a very great mechanical strength, and there are included a surfactant film forming step of forming a film including a surfactant on a surface of a substrate on which a thin film is to be formed, a vapor deposition step of causing the substrate to come in contact with a gas phase containing a silica derivative to form a thin film including the silica derivative, and a step of calcining the substrate having the thin film formed thereon and decomposing and removing the surfactant, the thin film being thus formed.