The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Dec. 11, 2001
Yoshinori Funaki, Himeji, JP;
Kiyoharu Tsutsumi, Himeji, JP;
Keizo Inoue, Himeji, JP;
Tomoko Adachi, Himeji, JP;
Yoshinori Funaki, Himeji, JP;
Kiyoharu Tsutsumi, Himeji, JP;
Keizo Inoue, Himeji, JP;
Tomoko Adachi, Himeji, JP;
Daicel Chemical Industries, Ltd., Osaka, JP;
Abstract
A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): wherein R, R, R, Rand Rare the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings. By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching.