The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Nov. 21, 2000
Erich Beck, Ladenburg, DE;
Oliver Deis, Rimbach, DE;
Peter Enenkel, Hessheim, DE;
Wolfgang Schrof, Neuleiningen, DE;
Erich Beck, Ladenburg, DE;
Oliver Deis, Rimbach, DE;
Peter Enenkel, Hessheim, DE;
Wolfgang Schrof, Neuleiningen, DE;
BASF Aktiengesellschaft, Ludwigshafen, DE;
Abstract
A process is described for producing molding compounds and coatings on substrates by curing radiation-curable compositions under inert gas by exposure to light wherein said inert gas comprises a gas heavier than air, and lateral escape of the inert gas in the course of radiation curing is prevented by means of appropriate apparatus or other measures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile