The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
May. 21, 2003
Chad A. Mirkin, Wilmette, IL (US);
Jung-hyurk Lim, Evanston, IL (US);
Chad A. Mirkin, Wilmette, IL (US);
Jung-Hyurk Lim, Evanston, IL (US);
Northwestern University, Evanston, IL (US);
Abstract
A method of nanolithography includes transporting a patterning compound from a nanoscopic tip to a substrate to form a pattern on the substrate. The patterning compound has a first electrostatic charge and the substrate has a second electrostatic charge which is opposite to the first electrostatic charge. The patterning compound can be an electrically conductive polymer having a charged polymer backbone. The patterns can be dots and lines having lateral dimensions of less than one micron. No electrical bias from an external voltage source between the tip and the substrate is needed.