The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2006

Filed:

Jul. 18, 2001
Applicants:

Jürgen Krauter, Dreieich, DE;

Jörg Pietsch, Kälberauer Strasse, DE;

Peter Panster, Rodenbach, DE;

Klaus Köhler, Ismaning, DE;

Roland Heidenreich, München, DE;

Inventors:

Jürgen Krauter, Dreieich, DE;

Jörg Pietsch, Kälberauer Strasse, DE;

Peter Panster, Rodenbach, DE;

Klaus Köhler, Ismaning, DE;

Roland Heidenreich, München, DE;

Assignee:

Degussa AG, Dusseldorf, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07C 2/08 (2006.01); C07C 2/72 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method for carrying out CC-coupling reactions, in particular a Heck and Suzuki reaction, in the presence of supported palladium as the catalyst and a base in a monophase or multiphase solvent mixture. According to said method, palladium detaches itself from the support in a characteristic manner, is redeposited after the reaction and the quantity of palladium not deposited after the reaction is significantly lower than 5000 ppm, in relation to the palladium used.


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