The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2006

Filed:

Dec. 18, 2001
Applicants:

Weiqing Weng, Houston, TX (US);

Aspy K. Mehta, Humble, TX (US);

Pawan K. Agarwal, Houston, TX (US);

Armenag Dekmezian, Kingwood, TX (US);

Inventors:

Weiqing Weng, Houston, TX (US);

Aspy K. Mehta, Humble, TX (US);

Pawan K. Agarwal, Houston, TX (US);

Armenag Dekmezian, Kingwood, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 23/14 (2006.01); C08L 23/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of lowering MFR response of a high-melt-flow-rate-polymer-producing metallocene catalyst is provided. The method includes contacting the metallocene catalyst with a sufficient quantity of α,ω-diene monomer such that when the catalyst composition is contacted with polymerizable reactants under suitable polymerization conditions, the resulting polymer has an MFR rate in the range of 0.1 to 1000. Hydrogen and ethylene may also be present in the polymerization. Additionally a catalyst composition is provided which includes a high-melt-flow-rate-polymer-producing metallocene catalyst and a sufficient quantity of α,ω-diene monomers such that when the catalyst composition is contacted with a monomer under polymerization conditions, the resulting polymer has an MFR rate in the range of 0.1 to 1000.


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