The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Sep. 25, 2002
Yutaka Mori, Fukuoka, JP;
Hanako Kato, Fukuoka, JP;
Katsuya Funayama, Fukuoka, JP;
Mitsubishi Chemical Corporation, Tokyo, JP;
Abstract
Silica with a large pore volume, a large specific surface area, a narrow pore distribution, low contents of unwanted metal impurities, and excellent physical properties such as high heat-resistance and water-resistance is provided. The silica has a mode pore diameter (D) of 20 nm or less, and a solid-state Si nuclear magnetic resonance (hereinafter called solid-state Si NMR) spectrum of the silica includes a chemical shift (δ ppm) of Qpeak meeting the following inequality (I).−0.0705×()−110.36>δ  (I) The silica with such properties can be suitably used in fields of which particularly excellent heat resistance and water resistance are required, and moreover controlled pore properties, and the fact that physical properties scarcely change over a long period of time are required among the above-mentioned applications.