The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Jun. 26, 2003
Yukio Taniguchi, Yokohama, JP;
Masakiyo Matsumura, Yokohama, JP;
Hirotaka Yamaguchi, Yokohama, JP;
Mikihiko Nishitani, Yokohama, JP;
Susumu Tsujikawa, Yokohama, JP;
Yoshinobu Kimura, Yokohama, JP;
Masayuki Jyumonji, Yokohama, JP;
Yukio Taniguchi, Yokohama, JP;
Masakiyo Matsumura, Yokohama, JP;
Hirotaka Yamaguchi, Yokohama, JP;
Mikihiko Nishitani, Yokohama, JP;
Susumu Tsujikawa, Yokohama, JP;
Yoshinobu Kimura, Yokohama, JP;
Masayuki Jyumonji, Yokohama, JP;
Advanced LCD Technologies Development Center Co., Ltd., Yokohama, JP;
Abstract
A crystallization apparatus includes an optical illumination system to illuminate a phase shift mask and which irradiates an amorphous semiconductor film with a light beam having an inverse peak type light intensity distribution including a minimum light intensity in a point corresponding to a phase shift portion of the phase shift mask to produce a crystallized semiconductor film. A wavefront dividing element is disposed on a light path between the optical illumination system and the phase shift mask. The wavefront dividing element wavefront-divides the light beam supplied from the optical illumination system into a plurality of light beams, and condenses the wavefront-divided light beams in the corresponding phase shift portion or in the vicinity of the portion.