The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Oct. 15, 2004
Boguslaw a Swedek, Cupertino, CA (US);
Nils Johansson, Los Gatos, CA (US);
Andreas Norbert Wiswesser, Mountain View, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Boguslaw A Swedek, Cupertino, CA (US);
Nils Johansson, Los Gatos, CA (US);
Andreas Norbert Wiswesser, Mountain View, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A system includes a measuring station for positioning an eddy current probe proximate to a substrate in a substrate holder. The probe can produce a time-varying magnetic field, in order to induce eddy currents in one or more conductive regions of a substrate either prior to or subsequent to polishing. The eddy current signals are detected, and may be used to update one or more polishing parameters for a chemical mechanical polishing system. The substrate holder may be located in a number places; for example, in a substrate transfer system, a factory interface module, a cleaner, or in a portion of the chemical mechanical polishing system away from the polishing stations. Additional probes may be used.