The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Feb. 20, 2003
Applicants:
Myung-ah Kang, Busan, KR;
In-kyun Shin, Suwon, KR;
Inventors:
Myung-Ah Kang, Busan, KR;
In-Kyun Shin, Suwon, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01F 9/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of manufacturing an alternating phase shift mask can be carried out in a short amount of time. A 180° phase shift region is formed using a multi-step etching process, and then a 0° phase region is formed. Forming the phase shift regions in this sequence minimizes the number of rounds of photolithography that have to be carried out in the method.