The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Sep. 08, 2003
William P. Parker, Waitsfield, VT (US);
Julie W. Parker, Waitsfield, VT (US);
William P. Parker, Waitsfield, VT (US);
Julie W. Parker, Waitsfield, VT (US);
Marsupial Holdings, Inc., Waitsfield, VT (US);
Abstract
A method of fabricating a holographic mask includes the steps of providing an illumination source and a non-opaque object mask. The source is for generating a coherent illumination beam directed along an axis. The object mask is capable of transmitting a portion of the illumination beam as undiffracted reference wavefronts. The object mask has one or more substantially transparent elements for creating overlapping object wavefronts when the illumination beam is incident thereon. The object mask is disposed in the illumination beam. A holographic recording medium is provided in the illumination beam in line optically with the object mask. The object mask is illuminated with the illumination beam, thereby causing the object mask to allow undiffracted reference wavefronts to pass therethrough. The illumination directed along the axis causes the one or more substantially transparent elements to create object wavefronts which interact with the undiffracted reference wavefronts to create an interference pattern.