The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Nov. 16, 2004
Applicants:
Takafumi Hashiguchi, Kumamoto, JP;
Takehisa Yamaguchi, Kumamoto, JP;
Naoki Nakagawa, Kumamoto, JP;
Inventors:
Assignee:
Kabushiki Kaisha Advanced Display, Kumamoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/136 (2006.01);
U.S. Cl.
CPC ...
Abstract
The widths of those portions of a semiconductor layerand a drain lineoverlapping with it which cross an edge line of a gate electrodeare made smaller than the channel width of a thin-film transistor. With this measure, the overlap area of the gate electrodeand a drain electrodeis reduced. As a result, a variation of the above overlap area due to alignment errors in a photolithography apparatus used in patterning the gate linesthe drain electrodesand source electrodescan be reduced and the frequency of occurrence of display defects can be decreased.