The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Jan. 17, 2002
Jiro Suzuki, Tokyo, JP;
Toshiyuki Ando, Tokyo, JP;
Hiroshi Suzuki, Tokyo, JP;
Shusou Wadaka, Tokyo, JP;
Yoshihito Hirano, Tokyo, JP;
Izumi Mikami, Tokyo, JP;
Tadashi Matsushita, Tokyo, JP;
Jiro Suzuki, Tokyo, JP;
Toshiyuki Ando, Tokyo, JP;
Hiroshi Suzuki, Tokyo, JP;
Shusou Wadaka, Tokyo, JP;
Yoshihito Hirano, Tokyo, JP;
Izumi Mikami, Tokyo, JP;
Tadashi Matsushita, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
An optical system deviation estimating apparatus includes an erected/inverted attitude setting meansfor changing dispositional attitude of an optical system under test, a non-interferometric type wavefront measuring meansfor measuring wavefronts at the attitudes as set up without resorting to interference phenomenon of light, a polynomial approximation meansfor expanding measured wavefront values determined by the non-interferometric type wavefront measuring meansto a polynomial, an averaging arithmetic meansfor averaging the measured values derived from output of the non-interferometric type wavefront measuring meansor alternatively arithmetic values derived from output of the polynomial approximation means, and a polynomial specific coefficient extraction arithmetic meansfor extracting specific coefficient values of the polynomial.