The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Jan. 16, 2002
Hans Warlimont, Freigericht, DE;
Hans Warlimont, Freigericht, DE;
DSL Dresden Material-Innovation GmbH, Dresden, DE;
Abstract
A continuous electroforming process to form a strip for battery electrodes, comprising the steps of providing a mandrel having on its surface a reusable pattern subdivided into conductive and non-conductive areas; moving said mandrel through an electroforming bath to deposit a metal layer on said mandrel while it moves through the electroforming bath until the metal layer has assumed the shape of the conductive pattern and a thickness at least sufficient to provide strength for the layer to be removed from said mandrel; and separating said layer from said mandrel; is characterised by moving said strip through at least one subsequent bath in which electrodeposition of metal takes place on both sides of said strip while it is moved through said subsequent bath, applying a current density of at least 10 A/dm2 and up to 300 A/dm2 to the conductive surface of the moving mandrel and to the metal surface of the strip in each of the subsequent baths; and directing a forced flow of electrolyte onto the surface of the layer and said strip, wherein the reusable conductive pattern of the surface of the mandrel takes the form of at least one battery electrode and the electrolyte contains additives providing increased hardness, increased corrosion resistance and being suited specifically to permit combining a high rate of deposition with controlled surface roughness and controlled composition of the deposit.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile